CTIA’s TZM Alloy in Single Crystal Silicon Furnace

TZM alloy (Titanium Zirconium Molybdenum) used in single crystal silicon furnace is manufactured through powder metallurgy processes and features excellent high-temperature strength, creep resistance, dimensional stability, and vacuum compatibility. Single crystal silicon growth processes require long-term continuous operation under high-temperature, vacuum, or inert atmosphere conditions, where furnace components are exposed to thermal radiation, temperature cycling, and mechanical loads. CTIA’s TZM alloy provides stable microstructure and reliable high-temperature performance, effectively meeting the demanding requirements of single crystal silicon growth applications.
Advantages of CTIA’s TZM Alloy in Single Crystal Silicon Furnace
(1) Strong High-Temperature Load-Bearing Capability
Maintain high-temperature strength with a melting point of approximately 2620℃, enabling long-term resistance to thermal loads and component weight inside the furnace.
(2) Excellent High-Temperature Deformation Resistance
Provide excellent creep resistance to reduce dimensional changes during prolonged high-temperature operation and maintain thermal field stability.
(3) Reliable Thermal Cycling Performance
Reduce thermal stress during repeated heating and cooling cycles through a coefficient of thermal expansion of approximately 5.5–5.9×10⁻⁶/K.
(4) Strong Vacuum Compatibility
Deliver stable performance with low volatility at high temperatures, making TZM alloy suitable for long-term operation under vacuum or inert atmosphere conditions.
(5) Precision Machining Capability
Support high-precision customized machining according to single crystal silicon furnace structures and installation requirements.
Applications of CTIA’s TZM Alloy in Single Crystal Silicon Furnace
(1) Semiconductor Single Crystal Silicon Manufacturing
Used for crucible support components, thermal field structural parts, and high-temperature load-bearing components to maintain stable crystal growth processes.
(2) Photovoltaic Silicon Material Production
Used for heat shield supports, connecting components, and internal furnace structures to meet long-term high-temperature cycling requirements.
(3) Electronic Material Manufacturing
Used for high-temperature structural components in high-purity silicon and functional material growth equipment to improve operational reliability.
Specifications of CTIA’s TZM Alloy in Single Crystal Silicon Furnace
(1) Product Forms: TZM plates, rods, blocks, and customized components.
(2) Dimensions: Customized sizes and complex structures are available.
CTIA GROUP has nearly 30 years of experience in molybdenum and molybdenum alloy manufacturing, with expertise in powder metallurgy and precision machining. CTIA offers TZM plates, rods, blocks, and customized components for single crystal silicon furnace applications, supported by strict control of material quality, manufacturing processes, and machining accuracy. Our TZM products are suitable for crucible supports, thermal field structures, and other high-temperature furnace components requiring reliable performance under demanding operating conditions.
For any inquiry, please contact molybdenum and molybdenum alloy manufacturer: CTIA GROUP
Email: sales@chinatungsten.com
Tel: 0086 592 5129696 / 0086 592 5129595
Website: www.molybdenum.com.cn
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